The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2017
Filed:
May. 20, 2011
Kaoru Iwato, Shizuoka, JP;
Hidenori Takahashi, Shizuoka, JP;
Shuji Hirano, Shizuoka, JP;
Sou Kamimura, Shizuoka, JP;
Keita Kato, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
Hidenori Takahashi, Shizuoka, JP;
Shuji Hirano, Shizuoka, JP;
Sou Kamimura, Shizuoka, JP;
Keita Kato, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided is a method of forming a pattern and an actinic-ray- or radiation-sensitive resin composition that excels in the limiting resolving power, roughness characteristics, exposure latitude (EL) and bridge defect performance. The method of forming a pattern includes (1) forming an actinic-ray- or radiation-sensitive resin composition into a film, (2) exposing the film to light, and (3) developing the exposed film with a developer containing an organic solvent. The actinic-ray- or radiation-sensitive resin composition contains (A) a resin containing a repeating unit with a structural moiety that is configured to decompose when exposed to actinic rays or radiation to thereby generate an acid, and (B) a solvent.