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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9904167 B1

PDFFull Text
Date of Patent:
Feb. 27, 2018

Filed:

Dec. 29, 2015

Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventor:

Tomotaka Tsuchimura, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); H01L 21/027 (2006.01); C07D 327/08 (2006.01); C07C 309/15 (2006.01); C07D 333/76 (2006.01); C07C 311/16 (2006.01); C07C 327/24 (2006.01); C07C 381/12 (2006.01); C07D 209/48 (2006.01); C07D 333/46 (2006.01); C07D 335/16 (2006.01); C07D 339/08 (2006.01); C07C 311/14 (2006.01); C07D 347/00 (2006.01); C07C 311/48 (2006.01); C07C 311/51 (2006.01); C07C 327/22 (2006.01); C07C 327/26 (2006.01); C07D 493/08 (2006.01); C07C 25/18 (2006.01); C07J 31/00 (2006.01); C07J 41/00 (2006.01); C07C 309/19 (2006.01); C07C 321/28 (2006.01); C07C 323/09 (2006.01); C07C 323/20 (2006.01); H01L 29/16 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 25/18 (2013.01); C07C 309/15 (2013.01); C07C 309/19 (2013.01); C07C 311/14 (2013.01); C07C 311/16 (2013.01); C07C 311/48 (2013.01); C07C 311/51 (2013.01); C07C 321/28 (2013.01); C07C 323/09 (2013.01); C07C 323/20 (2013.01); C07C 327/22 (2013.01); C07C 327/24 (2013.01); C07C 327/26 (2013.01); C07C 381/12 (2013.01); C07D 209/48 (2013.01); C07D 327/08 (2013.01); C07D 333/46 (2013.01); C07D 333/76 (2013.01); C07D 335/16 (2013.01); C07D 339/08 (2013.01); C07D 347/00 (2013.01); C07D 493/08 (2013.01); C07J 31/006 (2013.01); C07J 41/0055 (2013.01); C07J 41/0061 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); H01L 21/0271 (2013.01); H01L 21/0276 (2013.01); H01L 29/16 (2013.01); C07C 2601/08 (2017.05); C07C 2601/14 (2017.05); C07C 2602/42 (2017.05); C07C 2603/18 (2017.05); C07C 2603/24 (2017.05); C07C 2603/74 (2017.05);
Abstract

Provided is an active light sensitive or radiation sensitive resin composition which contains a compound (A) represented by General Formula (I) or (II): in the formulae, each of Yand Yrepresents a monovalent organic group; each of Mand Mrepresents an organic onium ion; each of Xand Xrepresents a group that is represented by —S—, —NH—, or —NR—; Rrepresents a monovalent organic group; each of n1 and n2 represents an integer of 1 or more; and Rand Yor Ymay bond with each other to form a ring.

Find Patent Forward Citations

Tsuchimura, Tomotaka. (2018). Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device (U.S. Patent No. 9904167). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9904167

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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