The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2018
Filed:
Dec. 04, 2014
Applicant:
Fujifilm Corporation, Minato-ku, Tokyo, JP;
Inventors:
Takuya Tsuruta, Haibara-gun, JP;
Tomotaka Tsuchimura, Haibara-gun, JP;
Tadeteru Yatsuo, Haibara-gun, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/038 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C07D 333/46 (2006.01); C07D 327/08 (2006.01); C07C 309/65 (2006.01); C07C 381/12 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 309/65 (2013.01); C07C 381/12 (2013.01); C07D 327/08 (2013.01); C07D 333/46 (2013.01); G03F 7/0046 (2013.01); G03F 7/038 (2013.01); G03F 7/0382 (2013.01); G03F 7/0397 (2013.01); G03F 7/2037 (2013.01); G03F 7/325 (2013.01); C07C 2601/14 (2017.05);
Abstract
An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. In the formula, Yand Yeach independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group. Z represents a hydrogen atom or a substituent. * represents a linking site with a residue of the compound (A)