The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2017
Filed:
Mar. 25, 2011
Shohei Kataoka, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
Sou Kamimura, Shizuoka, JP;
Toru Tsuchihashi, Shizuoka, JP;
Yuichiro Enomoto, Shizuoka, JP;
Kana Fujii, Shizuoka, JP;
Kazuyoshi Mizutani, Shizuoka, JP;
Shinji Tarutani, Shizuoka, JP;
Keita Kato, Shizuoka, JP;
Shohei Kataoka, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
Sou Kamimura, Shizuoka, JP;
Toru Tsuchihashi, Shizuoka, JP;
Yuichiro Enomoto, Shizuoka, JP;
Kana Fujii, Shizuoka, JP;
Kazuyoshi Mizutani, Shizuoka, JP;
Shinji Tarutani, Shizuoka, JP;
Keita Kato, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided is an actinic-ray- or radiation-sensitive resin composition and a method of forming a pattern using the same, ensuring excellent the etching resistivity and the stability during a post-exposure delay (PED) period. The composition contains a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, and a compound that generates an acid of pKa≧−1.5 when exposed to actinic rays or radiation.