The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2014
Filed:
Mar. 15, 2012
Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same
Applicants:
Kana Fujii, Shizuoka, JP;
Tomotaka Tsuchimura, Shizuoka, JP;
Toru Fujimori, Shizuoka, JP;
Hidenori Takahashi, Shizuoka, JP;
Takayuki Ito, Shizuoka, JP;
Inventors:
Kana Fujii, Shizuoka, JP;
Tomotaka Tsuchimura, Shizuoka, JP;
Toru Fujimori, Shizuoka, JP;
Hidenori Takahashi, Shizuoka, JP;
Takayuki Ito, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/30 (2013.01); Y10S 430/106 (2013.01); Y10S 430/111 (2013.01); Y10S 430/12 (2013.01);
Abstract
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin that is decomposed when acted on by an acid to thereby increase its solubility in an alkali developer, a compound that generates an acid when exposed to actinic rays or radiation, and any of basic compounds of general formula (1) below.