The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2018
Filed:
Aug. 12, 2016
Applicant:
Fujifilm Corporation, Minato-Ku, Tokyo, JP;
Inventors:
Yuichiro Enomoto, Shizuoka-ken, JP;
Shinji Tarutani, Shizuoka-ken, JP;
Sou Kamimura, Shizuoka-ken, JP;
Kaoru Iwato, Shizuoka-ken, JP;
Keita Kato, Shizuoka-ken, JP;
Kana Fujii, Shizuoka-ken, JP;
Assignee:
FUJIFILM Corporation, Minato-Ku, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/32 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/42 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/325 (2013.01); G03F 7/0382 (2013.01); G03F 7/0397 (2013.01); G03F 7/20 (2013.01); G03F 7/422 (2013.01); G03F 7/0046 (2013.01); G03F 7/2041 (2013.01);
Abstract
Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.