The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2015
Filed:
Feb. 27, 2012
Applicants:
Kana Fujii, Shizuoka, JP;
Hidenori Takahashi, Shizuoka, JP;
Fumiyuki Nishiyama, Shizuoka, JP;
Inventors:
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/039 (2006.01); G03F 7/32 (2006.01); B23B 3/10 (2006.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); G03F 7/0397 (2013.01); G03F 7/20 (2013.01); G03F 7/2041 (2013.01); G03F 7/325 (2013.01); B23B 3/10 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01);
Abstract
A resist composition includes a resin (A) containing any of repeating units (a) of general formulae (I-a) and (I-b) below and any of repeating units (b) of general formula (II) below but containing substantially no repeating unit in which an alcoholic hydroxyl group is introduced, and any of compounds (B) of general formulae (III-a) and (III-b) below.
Quick Actions:
Fujii, Kana. (2015). Resist composition, resist film therefrom and method of forming negative pattern using the composition (U.S. Patent No. 9122151). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9122151
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile