logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10248019 B1

PDFFull Text
Date of Patent:
Apr. 02, 2019

Filed:

Dec. 21, 2012

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Shohei Kataoka, Shizuoka, JP;

Kaoru Iwato, Shizuoka, JP;

Kana Fujii, Shizuoka, JP;

Sou Kamimura, Shizuoka, JP;

Yuichiro Enomoto, Shizuoka, JP;

Keita Kato, Shizuoka, JP;

Shuhei Yamaguchi, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 303/32 (2006.01); C07C 309/04 (2006.01); C07C 309/06 (2006.01); C07C 309/07 (2006.01); C07C 309/10 (2006.01); C07C 309/12 (2006.01); C07C 309/13 (2006.01); C07C 309/14 (2006.01); C07D 211/96 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/075 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); C07C 303/32 (2013.01); C07C 309/04 (2013.01); C07C 309/06 (2013.01); C07C 309/07 (2013.01); C07C 309/10 (2013.01); C07C 309/12 (2013.01); C07C 309/13 (2013.01); C07C 309/14 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); G03F 7/325 (2013.01); C07D 211/96 (2013.01); G03F 7/0755 (2013.01); G03F 7/11 (2013.01);
Abstract

A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.

Find Patent Forward Citations

Kataoka, Shohei. (2019). Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film (U.S. Patent No. 10248019). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10248019

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…