The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2019
Filed:
Dec. 21, 2012
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Shohei Kataoka, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
Kana Fujii, Shizuoka, JP;
Sou Kamimura, Shizuoka, JP;
Yuichiro Enomoto, Shizuoka, JP;
Keita Kato, Shizuoka, JP;
Shuhei Yamaguchi, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 303/32 (2006.01); C07C 309/04 (2006.01); C07C 309/06 (2006.01); C07C 309/07 (2006.01); C07C 309/10 (2006.01); C07C 309/12 (2006.01); C07C 309/13 (2006.01); C07C 309/14 (2006.01); C07D 211/96 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/075 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); C07C 303/32 (2013.01); C07C 309/04 (2013.01); C07C 309/06 (2013.01); C07C 309/07 (2013.01); C07C 309/10 (2013.01); C07C 309/12 (2013.01); C07C 309/13 (2013.01); C07C 309/14 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); G03F 7/325 (2013.01); C07D 211/96 (2013.01); G03F 7/0755 (2013.01); G03F 7/11 (2013.01);
Abstract
A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.