The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2014
Filed:
Aug. 26, 2011
Applicants:
Yuichiro Enomoto, Shizuoka, JP;
Shinji Tarutani, Shizuoka, JP;
Sou Kamimura, Shizuoka, JP;
Keita Kato, Shizuoka, JP;
Kana Fujii, Shizuoka, JP;
Inventors:
Yuichiro Enomoto, Shizuoka, JP;
Shinji Tarutani, Shizuoka, JP;
Sou Kamimura, Shizuoka, JP;
Keita Kato, Shizuoka, JP;
Kana Fujii, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/312 (2006.01); H01L 21/3105 (2006.01); G03F 7/039 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01); G03F 7/20 (2006.01); H01L 29/02 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/40 (2013.01); G03F 7/0397 (2013.01); G03F 7/325 (2013.01); G03F 7/405 (2013.01); G03F 7/2041 (2013.01); H01L 29/02 (2013.01); G03F 7/20 (2013.01); G03F 7/0382 (2013.01);
Abstract
Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, (c) developing the exposed film with a developer containing an organic solvent, and (d) rinsing the developed film with a rinse liquid containing an organic solvent, which rinse liquid has a specific gravity larger than that of the developer.