The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2015
Filed:
Jan. 07, 2011
Yuichiro Enomoto, Shizuoka, JP;
Shinji Tarutani, Shizuoka, JP;
Sou Kamimura, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
Keita Kato, Shizuoka, JP;
Akinori Shibuya, Shizuoka, JP;
Yuichiro Enomoto, Shizuoka, JP;
Shinji Tarutani, Shizuoka, JP;
Sou Kamimura, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
Keita Kato, Shizuoka, JP;
Akinori Shibuya, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.