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Shizuoka, Japan

Akinori Shibuya

USPTO Granted Patents = 49 (Patent Applications = 23)

EPO Patents = 12 (Patent Applications = 5)

Average Co-Inventor Count = 2.5

ph-index = 4

Forward Citations = 78(Granted Patents)

Location History:

Shizuoka-ken, JP (2007 - 2019)
Shizuoka, JP (2005 - 2023)
Haibara-gun, JP (2009 - 2024)

Company Filing History:

46 out of 16,115

Fujifilm Corporation

2 out of 16,458

Fuji Photo Film Company, Limited

Fufifilm Corporation

Years Active: 2005-2024

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Areas of Expertise:

Photosensitive Resin Composition

Pattern Forming Method

Semiconductor Device

Cured Film

Actinic Ray-Sensitive Resin

Lithography Method

Polyimide Precursor Composition

Adhesive Film

Electronic Device Manufacturing

Positive Resist Composition

Imprinting Technology

Circuit Substrate

49 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11899361 - Kit, composition for forming underlayer film for imprinting, laminate, and production method using the same (2024-02-13),

2. 11860538 - Photosensitive resin composition, heterocyclic ring-containing polymer precursor, cured film, laminate, method for producing cured film, and semiconductor device (2024-01-02),

3. 11567405 - Photosensitive resin composition, polymer precursor, cured film, laminate, method for producing cured film, and semiconductor device (2023-01-31),

4. 11441053 - Composition for forming adhesive film for imprinting, adhesive film, laminate, method for producing cured product pattern, and method for manufacturing circuit substrate (2022-09-13),

5. 11401361 - Curable composition for imprinting, cured product, pattern forming method, lithography method, pattern, mask for lithography, and polymerizable composition for imprinting (2022-08-02),

6. 11299653 - Composition, adhesive film, laminate, method for producing cured product pattern, and method for manufacturing circuit substrate (2022-04-12),

7. 10780679 - Laminate, method for manufacturing laminate, semiconductor device, and method for manufacturing the semiconductor device (2020-09-22),

8. 10649329 - Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device (2020-05-12),

9. 10538627 - Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, a semiconductor device, and method for producing polyimide precursor composition (2020-01-21),

10. 10526448 - Precursor composition, photosensitive resin composition, method for producing precursor composition, cured film, method for producing cured film, and semiconductor device (2020-01-07),

11. 10450417 - Resin, composition, cured film, method for manufacturing cured film and semiconductor device (2019-10-22),

12. 10234759 - Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern (2019-03-19),

13. 9841679 - Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device (2017-12-12),

14. 9551931 - Method of forming pattern, actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, process for manufacturing electronic device and electronic device (2017-01-24),

15. 9523912 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound (2016-12-20),

Title: Akinori Shibuya: Innovator in Semiconductor Technology

Introduction

Akinori Shibuya, located in Shizuoka, Japan, is a prominent inventor with a remarkable portfolio consisting of 49 patents. His innovations primarily focus on underlayer films for imprinting, which play a significant role in semiconductor manufacturing. Shibuya's contributions to the field have yielded groundbreaking advancements in technology.

Latest Patents

Among Akinori Shibuya's latest patents is a kit that includes a curable composition for imprinting. This specific composition consists of a polymerizable compound featuring an aromatic ring, and a solvent-based underlayer film formulation. The innovation provides a solid film at 23° C that maintains essential structural characteristics. His work on photosensitive resin compositions has also led to the development of a fast-progressing cyclization reaction formula, enhancing both storage stability and performance in semiconductor device applications.

Career Highlights

Shibuya's career includes significant roles at renowned companies such as Fujifilm Corporation and Fuji Photo Film Company, Limited. His experience in these leading organizations has equipped him with the insights necessary to propel innovations in semiconductor technologies and materials. The impact of his inventions is palpable within the industry, enabling advances in circuit board production and related fields.

Collaborations

Throughout his career, Akinori Shibuya has collaborated with notable coworkers, including Shohei Kataoka and Shuhei Yamaguchi. These partnerships have fostered innovation and contributed to the development of numerous patentable ideas, enhancing the quality and scope of their technological advancements.

Conclusion

Akinori Shibuya stands out as a visionary inventor, instrumental in shaping the landscape of semiconductor technology. With a solid foundation of patents and collaborative efforts, his work continues to influence the future of innovations in the field. As technology evolves, Shibuya's contributions will undoubtedly serve as a cornerstone for further advancements in the industry.

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