The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2025
Filed:
Apr. 20, 2022
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/075 (2006.01); G03F 7/09 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); G03F 7/0757 (2013.01); G03F 7/091 (2013.01); G03F 7/2006 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); G03F 7/327 (2013.01);
Abstract
A composition for forming an underlayer film is used for forming an underlayer film under a resist film, the composition including a silicon atom-containing compound and a halogen-based solvent, in which a content of the halogen-based solvent is 1.0 ppb by mass to 50.0 ppm by mass with respect to a total mass of the composition for forming an underlayer film.
Fukuhara, Toshiaki. (2025). Composition for forming underlayer film, resist pattern forming method, and manufacturing method of electronic device (U.S. Patent No. 12346026). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12346026
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile