The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2015
Filed:
Oct. 05, 2010
Yuichiro Enomoto, Shizuoka, JP;
Sou Kamimura, Shizuoka, JP;
Shinji Tarutani, Shizuoka, JP;
Keita Kato, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
Yuichiro Enomoto, Shizuoka, JP;
Sou Kamimura, Shizuoka, JP;
Shinji Tarutani, Shizuoka, JP;
Keita Kato, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A pattern forming method includes: (i) forming a film from a chemical amplification resist composition; (ii) exposing the film, so as to form an exposed film; and (iii) developing the exposed film by using an organic solvent-containing developer, wherein the chemical amplification resist composition contains: (A) a resin substantially insoluble in alkali; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a crosslinking agent; and (D) a solvent, a negative chemical amplification resist composition used in the method, and a resist film formed from the negative chemical amplification resist composition.