Shrewsbury, MA, United States of America

Mingqi Li

This inventor holds 64 USPTO granted patents and 31 published patent applications and 3 EPO patents, primarily in Photoresist Compositions (CPC class G03F). Top assignees: Rohm & Haas Electronic Materials LLC, Dow Global Technolgoies LLC, Rohm and Haas Electronic Materials Korea Ltd.. Active years: 2012-2026.

USPTO Granted Patents = 64 

% Patents Active = 71.9

 

Average Co-Inventor Count = 5.1

ph-index = 5

Forward Citations = 108(Granted Patents)

Forward Citations (Not Self Cited) = 86(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Marlborough, MA (US) (2016 - 2023)
  • Shrewsbury, MA (US) (2012 - 2024)

Company Filing History:


Years Active: 2012-2026

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Areas of Expertise:
Photoresist Compositions
Thermal Acid Generators
Pattern Treatment Methods
Topcoat Compositions
Photoacid Generators
Block Copolymers
Surface Leveling Agents
Silicon-Containing Underlayers
Pattern Formation Methods
Fluorinated Thermal Acid Generators
Resins for Underlayers
Aromatic Resins
64 patents (USPTO):Explore Patents

Title: The Innovative Journey of Mingqi Li: A Patent Profile

Introduction

Mingqi Li, a prolific inventor based in Shrewsbury, MA, has made significant contributions to the field of electronic materials, holding an impressive total of 61 patents. His work primarily revolves around photoresist compositions and methods for pattern formation, which are critical in semiconductor manufacturing.

Latest Patents

Mingqi Li’s latest patents include innovative developments in photoresist compositions and pattern formation methods. One notable patent describes a photoresist composition that comprises a polymer, a photoacid generator, an additive with a tertiary carbon atom as a ring-forming atom of a lactone ring, and a solvent. This composition enhances the efficiency and quality of semiconductor devices. Another significant patent outlines a method for pattern formation that includes applying a layer of the aforementioned photoresist composition over a semiconductor substrate, followed by pattern-wise exposure to i-line radiation and subsequent development to provide a resist relief image. This patent incorporates a non-ionic photoacid generator, a solvent, and two types of polymers, one of which includes a polymeric dye, showcasing Mingqi's innovative approach to improving semiconductor technology.

Career Highlights

Throughout his career, Mingqi Li has worked with leading companies in the electronic materials sector, including Rohm and Haas Electronic Materials LLC and Dow Global Technologies LLC. His roles in these organizations have allowed him to innovate solutions that address complex challenges in semiconductor manufacturing.

Collaborations

Mingqi Li has collaborated with esteemed professionals in the field, including Cheng-Bai Xu and Cong Liu. These partnerships have fostered a collective effort toward advancing technologies in photoresists and pattern formation methods, furthering innovation in semiconductor applications.

Conclusion

Mingqi Li's contributions to the field of electronic materials have significantly impacted semiconductor manufacturing through his numerous patents. His innovative work continues to advance the technology and maintain the pace of innovation necessary for the growing demands of the electronics industry.

Profile summary based on public USPTO records.
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