The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2023
Filed:
Dec. 19, 2014
Applicant:
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Inventors:
Cong Liu, Shrewsbury, MA (US);
Doris H. Kang, Shrewsbury, MA (US);
Deyan Wang, Hudson, MA (US);
Cheng-Bai Xu, Southboro, MA (US);
Mingqi Li, Marlborough, MA (US);
Chunyi Wu, Shrewsbury, MA (US);
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS, LLC, Marlborough, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/11 (2006.01); G03F 7/16 (2006.01); G03F 7/32 (2006.01); C09D 201/00 (2006.01); C09D 201/02 (2006.01); C08F 220/10 (2006.01); C09D 7/20 (2018.01); C08L 101/12 (2006.01); C09D 133/14 (2006.01); C09D 133/16 (2006.01); H01L 21/027 (2006.01); C08K 5/101 (2006.01); C08K 5/05 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2041 (2013.01); C08F 220/10 (2013.01); C08L 101/12 (2013.01); C09D 7/20 (2018.01); C09D 133/14 (2013.01); C09D 201/00 (2013.01); C09D 201/02 (2013.01); G03F 7/11 (2013.01); G03F 7/16 (2013.01); G03F 7/20 (2013.01); G03F 7/32 (2013.01); C08K 5/05 (2013.01); C08K 5/101 (2013.01); C09D 133/16 (2013.01); H01L 21/0271 (2013.01);
Abstract
Topcoat compositions are provided that can be used in immersion lithography to form photoresist patterns. The topcoat compositions include a solvent system that comprises 1) a first organic solvent represented by formula (I),