Doris H Kang

Title: Innovations by Doris H. Kang: A Pioneer in Photoresist Technology

Introduction

Doris H. Kang is an accomplished inventor based in Shrewsbury, MA, with a remarkable portfolio of 11 patents. Her expertise in the field of semiconductor manufacturing and photoresist technology has led to significant advancements, particularly in the creation of compositions essential for photolithography.

Latest Patents

One of Doris H. Kang's latest patents focuses on photoresist topcoat compositions and methods of processing photoresist compositions. The innovation encompasses a matrix polymer combined with a surface active polymer, which contains specific polymerized units designed for optimal performance. This invention is particularly beneficial in the fabrication of semiconductor devices. Additionally, her topcoat compositions and photolithographic methods are applicable in immersion lithography, enabling the precise formation of photoresist patterns. These advancements represent critical developments in the electronics industry, specifically for manufacturers of semiconductor devices.

Career Highlights

Throughout her career, Doris has made impactful contributions while working for companies such as Rohm and Haas Electronic Materials LLC and Rohm and Haas Electronics Materials LLC. Her dedication to her field is evident through her innovative solutions and constant pursuit of excellence in semiconductor technology.

Collaborations

Doris H. Kang has collaborated with notable peers, including Cong Liu and Mingqi Li. These partnerships have fostered a dynamic exchange of ideas and research, enhancing the quality and applicability of her inventions in the industry.

Conclusion

Doris H. Kang is a prominent figure in the realm of photoresist technology, whose inventions are paving the way for advancements in semiconductor manufacturing. With her extensive patent portfolio, she continues to influence the future of technology through her innovative practices and collaborations.