The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2024
Filed:
Jun. 24, 2019
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Irvinder Kaur, Northborough, MA (US);
Cong Liu, Shrewsbury, MA (US);
Doris Kang, Shrewsbury, MA (US);
Chunyi Wu, Shrewsbury, MA (US);
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Abstract
Photoresist topcoat compositions comprise: a matrix polymer and a surface active polymer, wherein the surface active polymer comprises polymerized units of the following general formula (I): wherein: Rrepresents a hydrogen atom, a halogen atom, a C1-C4 alkyl group, or a C1-C4 haloalkyl group; Rindependently represents a hydrogen atom or an optionally substituted alkyl group, wherein at least one Ris not a hydrogen atom, wherein the Rgroups taken together optionally form a cyclic structure, and wherein the total number of carbon atoms for the Rgroups taken together is from 2 to 20; Rrepresents an optionally substituted C1-C4 alkylene group, wherein an Rgroup optionally forms a cyclic structure with R; and Rindependently represents C1-C4 fluoroalkyl groups; wherein the total polymerized units of general formula (I) are present in the surface active polymer in an amount of 95 wt % or more based on total polymerized units of the surface active polymer; and wherein the surface active polymer is present in the composition in an amount of from 0.1 to 30 wt % based on total solids of the composition; and an organic-based solvent system comprising a plurality of organic solvents. The invention finds particular applicability in the manufacture of semiconductor devices.