Shrewsbury, MA, United States of America

Chunyi Wu

This inventor holds 25 USPTO granted patents and 7 published patent applications and 4 EPO patents, primarily in Photolithography Processes. Top assignees: Rohm & Haas Electronic Materials LLC, Dow Global Technolgoies LLC, Dupont Electronic Materials International, LLC. Active years: 2006-2025.

USPTO Granted Patents = 25 (Patent Applications = 7)

% Patents Active = 92.0

EPO Patents = 4 (Patent Applications = 13)

Average Co-Inventor Count = 3.6

ph-index = 4

Forward Citations = 94(Granted Patents)

Location History:

Westford, MA (US) (2006)
Shrewsbury, MA (US) (2009 - 2024)

Company Filing History:

22 out of 696

Rohm & Haas Electronic Materials LLC

patents

1 out of 4,804

Dow Global Technolgoies LLC

patents

1 out of 20

Dupont Electronic Materials International, LLC

patents

4. 1 out of 23

Rohm and Haas Electronics Materials LLC

where one patent can have more than one assignee

Years Active: 2006-2025

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Areas of Expertise:

Photoresist Compositions

Photolithography

Topcoat Compositions

Pattern Formation

Sulfonamide Material

Ionic Compounds

Nitrogen-Containing Compounds

Leveler Compounds

Base-Reactive Components

Surface Active Additive

Polymer Composition

Processing Methods

25 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12234369 - Photoresist topcoat compositions and methods of processing photoresist compositions (2025-02-25),

2. 11940731 - Photoresist topcoat compositions and methods of processing photoresist compositions (2024-03-26),

3. 11846885 - Topcoat compositions and photolithographic methods (2023-12-19),

4. 11809077 - Photoresist compositions and pattern formation methods (2023-11-07),

5. 10719014 - Photoresists comprising amide component (2020-07-21),

6. 10558122 - Compositions comprising sulfonamide material and processes for photolithography (2020-02-11),

7. 10527934 - Photoresists comprising ionic compound (2020-01-07),

8. 10133179 - Pattern treatment methods (2018-11-20),

9. 9507260 - Compositions and processes for photolithography (2016-11-29),

10. 9475763 - Photoresist comprising nitrogen-containing compound (2016-10-25),

11. 9436082 - Compositions comprising base-reactive component and processes for photolithography (2016-09-06),

12. 9274427 - Compositions and processes for photolithography (2016-03-01),

13. 9122159 - Compositions and processes for photolithography (2015-09-01),

14. 9012128 - Photoresist and coated substrate comprising same (2015-04-21),

15. 9005880 - Compositions comprising sulfonamide material and processes for photolithography (2015-04-14),

Of course, I can help you with that! Here is a detailed article about inventor Chunyi Wu.

Title: Innovator Spotlight: Chunyi Wu - Pioneering Innovations in Semiconductor Technology

Introduction:

Chunyi Wu, a renowned inventor based in Shrewsbury, MA, has made significant contributions to the field of semiconductor technology. With an impressive portfolio of 24 patents, his groundbreaking work has revolutionized the manufacturing processes of semiconductor devices.

Latest Patents:

Among Chunyi Wu's latest patents is the development of Photoresist Topcoat Compositions and Methods of Processing Photoresist Compositions. These compositions feature a unique blend of surface-active polymers and organic solvents, making them ideal for enhancing the performance of photoresist materials in semiconductor manufacturing.

Career Highlights:

Chunyi Wu has had a distinguished career, having worked with prominent companies in the industry such as Rohm & Haas Electronic Materials LLC and Shipley Company, L.L.C. His expertise and innovative solutions have played a crucial role in advancing the field of semiconductor technology.

Collaborations:

Throughout his career, Chunyi Wu has collaborated with talented individuals in the industry. Notable coworkers include Deyan Wang and Cheng-Bai Xu, who have worked closely with him on various projects aimed at pushing the boundaries of semiconductor innovation.

Conclusion:

In conclusion, Chunyi Wu's relentless dedication to innovation and his pioneering spirit have cemented his position as a trailblazer in the field of semiconductor technology. His patents and contributions continue to drive advancements in the industry, making him a true visionary in the world of inventions and innovations.