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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11809077 B1

PDFFull Text
Date of Patent:
Nov. 07, 2023

Filed:

Mar. 11, 2021

Photoresist compositions and pattern formation methods

Applicant:

Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);

Inventors:

Thomas Cardolaccia, Natick, MA (US);

Jason A. DeSisto, Hopkinton, MA (US);

Choong-Bong Lee, Westborough, MA (US);

Mingqi Li, Shrewsbury, MA (US);

Tomas Marangoni, Marlborough, MA (US);

Chunyi Wu, Shrewsbury, MA (US);

Cong Liu, Shrewsbury, MA (US);

Gregory P. Prokopowicz, Worcester, MA (US);

Assignee:

ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);

Attorney:

CANTOR COLBURN LLP

Primary Examiner:

Cynthia H Kelly

Assistant Examiner:

Anna Malloy

Int. Cl.
CPC ...
G03F 7/004 (2006.01); C08F 220/28 (2006.01); C08F 220/18 (2006.01); G03F 7/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C08F 220/18 (2013.01); C08F 220/281 (2020.02); G03F 7/027 (2013.01);
Abstract

A photoresist composition comprises a first polymer formed by free radical polymerization. The first polymer comprises polymerized units formed from a monomer that comprises an ethylenically unsaturated double bond and an acid-labile group; a photoacid generator; a quencher of formula (1): and a solvent.

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Quick Actions:

Cardolaccia, Thomas. (2023). Photoresist compositions and pattern formation methods (U.S. Patent No. 11809077). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11809077

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