Shrewsbury, MA, United States of America

Cong Liu

This inventor holds 59 USPTO granted patents and 14 published patent applications and 7 EPO patents, primarily in Photoresist Compositions (CPC class G03F). Top assignees: Rohm & Haas Electronic Materials LLC, Dow Global Technolgoies LLC, Dupont Electronic Materials International, LLC. Active years: 2012-2026.

USPTO Granted Patents = 59 

% Patents Active = 88.1

 

Average Co-Inventor Count = 4.7

ph-index = 4

Forward Citations = 77(Granted Patents)

Forward Citations (Not Self Cited) = 66(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Marlborough, MA (US) (2014 - 2019)
  • Shrewsbury, MA (US) (2012 - 2024)

Company Filing History:


Years Active: 2012-2026

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Areas of Expertise:
Photoresist Compositions
Pattern Formation
Thermal Acid Generators
Topcoat Compositions
Photoacid Generating Compound
Base-Reactive Component
Ionic Compound
Lactone Generators
Hardmask
Photoresist Trimming
Sulfonyl Generators
59 patents (USPTO):Explore Patents

Title: **Cong Liu: Innovator in Semiconductor Technology**

Introduction

Cong Liu, a distinguished inventor based in Shrewsbury, MA, has made significant contributions to the field of semiconductor technology. With an impressive portfolio of 58 patents, he is recognized for his innovative approaches to photoresist compositions and processing methods that play a crucial role in the manufacturing of electronic devices.

Latest Patents

Among Liu's most recent patents are those focusing on photoresist topcoat compositions and methods for processing photoresist compositions. One notable invention is the formulation of a photoresist topcoat composition that includes a first polymer, which is aqueous base soluble, comprising 70 to 99 wt % of the total solids. This composition also features a second polymer with specific molecular structures, aimed at enhancing the performance of semiconductor devices. Additionally, Liu has developed detailed methods for forming electronic devices, which involve intricate steps like creating a photoresist layer, applying an overcoat composition, and utilizing an organic solvent developer. These advancements affirm Liu's commitment to enhancing efficiency in the semiconductor manufacturing industry.

Career Highlights

Cong Liu has notably worked with leading companies in the field, including Rohm and Haas Electronic Materials LLC and Dow Global Technologies LLC. His tenure at these organizations has not only enriched his experience but has also positioned him as a key contributor to advancements in semiconductor technology.

Collaborations

Throughout his career, Liu has collaborated with esteemed colleagues such as Cheng-Bai Xu and Mingqi Li. These partnerships have fostered an environment of innovation and have resulted in significant advancements in the technology he is passionate about.

Conclusion

Cong Liu exemplifies the spirit of innovation in the semiconductor industry. With a robust patent portfolio and a career dedicated to technological advancements, he continues to play a vital role in shaping the future of electronics. His work is a testament to the impact of diligent research and collaboration in driving forward manufacturing techniques that are essential in today's technology-driven world.

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