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Marlborough, MA, United States of America

Rohm and Haas Electronics Materials LLC

USPTO Granted Patents = 23

% Expired Patents = 39.1

Forward Citations = 155

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67 inventors (with patents filed for the assignee):

Maria Anna Rzeznik (3 out of 47 patents)

Jong Keun Park (3 out of 45 patents)

Seung-Hyun Lee (3 out of 14 patents)

4. Young Cheol Bae (3 out of 27 patents)

5. Deyan Wang (2 out of 65 patents)

6. Peter Trefonas, Iii (2 out of 118 patents)

7. James W Thackeray (2 out of 92 patents)

8. Cheng-Bai Xu (2 out of 65 patents)

9. Rosemary Bell (2 out of 11 patents)

10. Yi Liu (2 out of 12 patents)

11. Shintaro Yamada (1 out of 41 patents)

12. Tong Sun (1 out of 14 patents)

13. Egbert Woelk (1 out of 19 patents)

14. Ronald L DiCarlo, Jr (1 out of 18 patents)

15. Robert K Barr (1 out of 57 patents)

23 patents: Sort by Forward Citations

1. 10604856 - Reaction products of amine monomers and polymers containing saturated heterocyclic moieties as additives for electroplating baths (2020-03-31),

2. 9790606 - Method of treating gold or gold alloy with a surface treatment solution comprising a disulfide compound (2017-10-17),

3. 9612217 - Electroplating bath analysis (2017-04-04),

4. 9611402 - Hot melt compositions with improved etch resistance (2017-04-04),

5. 9436082 - Compositions comprising base-reactive component and processes for photolithography (2016-09-06),

6. 9076719 - Doping of a substrate via a dopant containing polymer film (2015-07-07),

7. 8975001 - Photoresist compositions and methods of forming photolithographic patterns (2015-03-10),

8. 8871428 - Compositions and processes for immersion lithography (2014-10-28),

9. 8822130 - Self-assembled structures, method of manufacture thereof and articles comprising the same (2014-09-02),

10. 8815754 - Photoresists and methods for use thereof (2014-08-26),

11. 8771917 - Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns (2014-07-08),

12. 8765356 - Calixarene compound and photoresist composition comprising same (2014-07-01),

13. 8697338 - Photolithographic methods (2014-04-15),

14. 8591636 - Plating catalyst and method (2013-11-26),

15. 8501266 - Method and apparatus (2013-08-06),

Company Overview

Rohm and Haas Electronics Materials LLC, based in Marlborough, MA, specializes in advanced materials for the electronics industry. The company focuses on developing innovative solutions for semiconductor manufacturing, including photoresists, dielectric materials, and other essential components that enhance device performance and reliability. With a commitment to research and development, Rohm and Haas plays a crucial role in advancing technologies that support the growing demands of the electronics sector globally.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

23 Patents

#22 in Marlborough, MA

#869 in Massachusetts

#14,438 in US

#27,714 in the World

Marlborough, MA, United States of America

Rohm and Haas Electronics Materials LLC

Forward Citations = 155

67 inventors:

Maria Anna Rzeznik (3 out of 47 patents)

Jong Keun Park (3 out of 45 patents)

Seung-Hyun Lee (3 out of 14 patents)

4. Young Cheol Bae (3 out of 27 patents)

5. Deyan Wang (2 out of 65 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Rohm and Haas Electronics Materials LLC. Retrieved from https://idiyas.com/company/rohm-and-haas-electronics-materials

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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