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Marlborough, MA, United States of America

Rohm and Haas Electronics Materials LLC

USPTO Granted Patents = 23

Forward Citations = 154

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67 inventors (with patents filed for the assignee):

Maria Anna Rzeznik (3 out of 47 patents)

Jong Keun Park (3 out of 45 patents)

Seung-Hyun Lee (3 out of 14 patents)

4. Young Cheol Bae (3 out of 27 patents)

5. Deyan Wang (2 out of 65 patents)

6. Peter Trefonas, Iii (2 out of 118 patents)

7. James W Thackeray (2 out of 92 patents)

8. Cheng-Bai Xu (2 out of 65 patents)

9. Rosemary Bell (2 out of 11 patents)

10. Yi Liu (2 out of 12 patents)

11. Shintaro Yamada (1 out of 39 patents)

12. Tong Sun (1 out of 14 patents)

13. Egbert Woelk (1 out of 19 patents)

14. Ronald L DiCarlo, Jr (1 out of 18 patents)

15. Robert K Barr (1 out of 57 patents)

23 patents: Sort by Forward Citations

1. 10604856 - Reaction products of amine monomers and polymers containing saturated heterocyclic moieties as additives for electroplating baths (2020-03-31),

2. 9790606 - Method of treating gold or gold alloy with a surface treatment solution comprising a disulfide compound (2017-10-17),

3. 9612217 - Electroplating bath analysis (2017-04-04),

4. 9611402 - Hot melt compositions with improved etch resistance (2017-04-04),

5. 9436082 - Compositions comprising base-reactive component and processes for photolithography (2016-09-06),

6. 9076719 - Doping of a substrate via a dopant containing polymer film (2015-07-07),

7. 8975001 - Photoresist compositions and methods of forming photolithographic patterns (2015-03-10),

8. 8871428 - Compositions and processes for immersion lithography (2014-10-28),

9. 8822130 - Self-assembled structures, method of manufacture thereof and articles comprising the same (2014-09-02),

10. 8815754 - Photoresists and methods for use thereof (2014-08-26),

11. 8771917 - Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns (2014-07-08),

12. 8765356 - Calixarene compound and photoresist composition comprising same (2014-07-01),

13. 8697338 - Photolithographic methods (2014-04-15),

14. 8591636 - Plating catalyst and method (2013-11-26),

15. 8501266 - Method and apparatus (2013-08-06),

Rohm and Haas Electronics Materials LLC is a leading provider of innovative materials for the electronics industry. With a focus on providing cutting-edge solutions for semiconductor manufacturing, their products are used in a wide range of applications including integrated circuits, display panels, and solar cells. Their commitment to research and development has made them a trusted partner for companies looking to stay at the forefront of technology.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 16 2025

23 Patents

#20 in Marlborough, MA

#837 in Massachusetts

#13,930 in US

#26,801 in the World

Marlborough, MA, United States of America

Rohm and Haas Electronics Materials LLC

Forward Citations = 154

67 inventors:

Maria Anna Rzeznik (3 out of 47 patents)

Jong Keun Park (3 out of 45 patents)

Seung-Hyun Lee (3 out of 14 patents)

4. Young Cheol Bae (3 out of 27 patents)

5. Deyan Wang (2 out of 65 patents)

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