The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2015
Filed:
Aug. 21, 2013
The Regents of the University of California, Oakland, CA (US);
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Rachel A. Segalman, Pleasanton, CA (US);
Megan L. Hoarfrost, Minneapolis, MN (US);
Ali Javey, Emeryville, CA (US);
Kuniharu Takei, Osaka, JP;
Peter Trefonas, III, Medway, MA (US);
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, Oakland, CA (US);
ROHM AND HAAS ELECTRONICS MATERIALS LLC, Marlborough, MA (US);
Abstract
Disclosed herein is a method for doping a substrate, comprising disposing a coating of a composition comprising a dopant-containing polymer and a non-polar solvent on a substrate; and annealing the substrate at a temperature of 750 to 1300° C. for 1 second to 24 hours to diffuse the dopant into the substrate; wherein the dopant-containing polymer is a polymer having a covalently bound dopant atom; wherein the dopant-containing polymer is free of nitrogen and silicon; and wherein the method is free of a step of forming an oxide capping layer over the coating prior to the annealing step.