The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2014
Filed:
Dec. 31, 2011
Matthias S. Ober, Midland, MI (US);
Young Cheol Bae, Weston, MA (US);
Yi Liu, Wayland, MA (US);
Seung-hyun Lee, Marlborough, MA (US);
Jong Keun Park, Hudson, MA (US);
Matthias S. Ober, Midland, MI (US);
Young Cheol Bae, Weston, MA (US);
Yi Liu, Wayland, MA (US);
Seung-Hyun Lee, Marlborough, MA (US);
Jong Keun Park, Hudson, MA (US);
Rohm and Haas Electronics Materials LLC, Marlborough, MA (US);
Dow Global Technologies LLC, Midland, MI (US);
Abstract
Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and electronic devices. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.