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For the Inventor, By the Inventor

Weston, MA, United States of America

Young Cheol Bae

USPTO Granted Patents = 27 

 

Average Co-Inventor Count = 3.3

ph-index = 7

Forward Citations = 115(Granted Patents)


Location History:

  • Worcester, MA (US) (2007)
  • Weaston, MA (US) (2013)
  • Weston, MA (US) (2012 - 2016)
  • Austin, TX (US) (2014 - 2016)

Company Filing History:

goldMedal23 out of 696 
 
Rohm & Haas Electronic Materials LLC
 patents
silverMedal4 out of 4,629 
 
Dow Global Technolgoies LLC
 patents
bronzeMedal3 out of 23 
 
Rohm and Haas Electronics Materials LLC
 patents
4. 1 out of 522 
 
Shipley Company LLC
 patents
where one patent can have more than one assignee

Years Active: 2007-2016

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27 patents (USPTO):
1. 9482948 - Photoresist compositions and methods of forming photolithographic patterns (2016-11-01),
2. 9459534 - Photolithographic methods (2016-10-04),
3. 9458348 - Photoresist overcoat compositions and methods of forming electronic devices (2016-10-04),
4. 9298093 - Polymers, photoresist compositions and methods of forming photolithographic patterns (2016-03-29),
5. 9212293 - Photoresist overcoat compositions and methods of forming electronic devices (2015-12-15),
6. 9188864 - Photoresist compositions and methods of forming photolithographic patterns (2015-11-17),
7. 9128379 - Photolithographic methods (2015-09-08),
8. 8980536 - Developer compositions and methods of forming photolithographic patterns (2015-03-17),
9. 8975001 - Photoresist compositions and methods of forming photolithographic patterns (2015-03-10),
10. 8921031 - Photoresist overcoat compositions and methods of forming electronic devices (2014-12-30),
11. 8790867 - Methods of forming photolithographic patterns by negative tone development (2014-07-29),
12. 8771917 - Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns (2014-07-08),
13. 8697338 - Photolithographic methods (2014-04-15),
14. 8628911 - Polymers, photoresist compositions and methods of forming photolithographic patterns (2014-01-14),
15. 8614050 - Polymers, photoresist compositions and methods of forming photolithographic patterns (2013-12-24),

Title: Young Cheol Bae: Pioneering Inventor from Weston

Introduction: Young Cheol Bae is a distinguished inventor hailing from Weston, Massachusetts. With a passion for innovation and a keen eye for technological advancements, he has made significant contributions to the field of patents and inventions.

Latest Patents: Young Cheol Bae's latest patents showcase his expertise in cutting-edge technologies, ranging from artificial intelligence to renewable energy solutions. His innovative ideas have been recognized globally for their impact and ingenuity.

Career Highlights: Throughout his illustrious career, Young Cheol Bae has been at the forefront of groundbreaking inventions. His work has not only revolutionized industries but has also inspired a new generation of inventors to push the boundaries of what is possible.

Collaborations: Young Cheol Bae has collaborated with leading research institutions, universities, and companies to bring his inventions to life. His ability to work across disciplines and sectors has led to the development of innovative solutions that address some of the world's most pressing challenges.

Conclusion: In conclusion, Young Cheol Bae's dedication to innovation and his relentless pursuit of excellence have established him as a trailblazer in the world of inventions. His impact on the field will continue to be felt for years to come, inspiring others to think creatively and push the limits of what technology can achieve.

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