The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2015
Filed:
Dec. 03, 2014
Applicant:
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Inventors:
Young Cheol Bae, Austin, TX (US);
Rosemary Bell, Wayland, MA (US);
Jong Keun Park, Westborough, MA (US);
Seung-Hyun Lee, Gyeonggi Do, KR;
Assignee:
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); C09D 133/16 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); C08K 5/17 (2006.01); C08K 5/3415 (2006.01); C08K 5/3435 (2006.01); C09D 133/10 (2006.01); H01L 21/308 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
C09D 133/16 (2013.01); C08K 5/17 (2013.01); C08K 5/3415 (2013.01); C08K 5/3435 (2013.01); C09D 133/10 (2013.01); G03F 7/004 (2013.01); G03F 7/11 (2013.01); G03F 7/20 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); G03F 7/325 (2013.01); H01L 21/3081 (2013.01); Y10S 430/114 (2013.01); Y10S 430/12 (2013.01);
Abstract
Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.