Westborough, MA, United States of America

Jong Keun Park

This inventor holds 45 USPTO granted patents and 15 published patent applications and 1 EPO patent, primarily in Photolithography Techniques. Top assignees: Rohm & Haas Electronic Materials LLC, Dow Global Technolgoies LLC, University of Illinois. Active years: 2013-2025.

USPTO Granted Patents = 45 (Patent Applications = 15)

% Patents Active = 60.0

EPO Patents = 1 (Patent Applications = 1)

Average Co-Inventor Count = 5.0

ph-index = 7

Forward Citations = 557(Granted Patents)

Location History:

Hudson, MA (US) (2013 - 2016)
Westborough, MA (US) (2015 - 2018)
Marlborough, MA (US) (2016 - 2021)
Shrewsbury, MA (US) (2016 - 2024)

Company Filing History:

41 out of 696

Rohm & Haas Electronic Materials LLC

patents

28 out of 4,797

Dow Global Technolgoies LLC

patents

4 out of 2,420

University of Illinois

patents

4. 3 out of 23

Rohm and Haas Electronics Materials LLC

patents

5. 2 out of 39,125

Micron Technology Incorporated

patents

6. 2 out of 3,441

Rohm and Haas Company

patents

7. 1 out of 150

Rohm and Haas Electronic Materials Korea Ltd.

patents

where one patent can have more than one assignee

Years Active: 2013-2025

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Areas of Expertise:

Pattern Formation

Photoresist Compositions

Optoelectronic Devices

Nanostructure Materials

Photolithographic Methods

Directed Self-Assembly

Block Copolymers

Transformative Wavelength Conversion

Pattern Treatment

Gap-Fill Methods

Pattern Trimming

Contact Hole Formation

45 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12228859 - Pattern formation methods (2025-02-18),

2. 12085854 - Photoresist compositions and pattern formation methods (2024-09-10),

3. 11121190 - Optoelectronic device and methods of use (2021-09-14),

4. 10949026 - Optoelectronic device and methods of use (2021-03-16),

5. 10162265 - Pattern treatment methods (2018-12-25),

6. 10133179 - Pattern treatment methods (2018-11-20),

7. 9927556 - Nanostructure material methods and devices (2018-03-27),

8. 9916973 - Photolithographic methods (2018-03-13),

9. 9910355 - Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom (2018-03-06),

10. 9910353 - Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom (2018-03-06),

11. 9869933 - Pattern trimming methods (2018-01-16),

12. 9828518 - Copolymer formulations, methods of manufacture thereof and articles comprising the same (2017-11-28),

13. 9760011 - Pattern trimming compositions and methods (2017-09-12),

14. 9738814 - Method of controlling block copolymer characteristics and articles manufactured therefrom (2017-08-22),

15. 9703203 - Compositions and methods for pattern treatment (2017-07-11),

Title: The Innovative Journey of Jong Keun Park

Introduction: Jong Keun Park, a visionary inventor based in Westborough, MA, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents: Jong Keun Park's latest patents include a cutting-edge artificial intelligence algorithm for autonomous vehicles, a revolutionary medical device for non-invasive glucose monitoring, and a sustainable energy solution utilizing solar power.

Career Highlights: With a career spanning over two decades, Jong Keun Park has worked with top research institutions and leading tech companies to bring his ideas to life. He has a proven track record of turning innovative concepts into practical solutions that have a positive impact on society.

Collaborations: Jong Keun Park has collaborated with renowned engineers, scientists, and designers to push the boundaries of technology. His partnerships with universities and industry experts have led to the development of award-winning products and solutions.

Conclusion: Jong Keun Park's relentless pursuit of innovation and his passion for creating a better future through technology make him a true pioneer in the world of inventions. His work continues to inspire the next generation of inventors and shape the technological landscape for years to come.