The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2017

Filed:

Dec. 23, 2014
Applicants:

Dow Global Technologies Llc, Midland, MI (US);

Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);

Inventors:

Shih-Wei Chang, Natick, MA (US);

Jong Keun Park, Westborough, MA (US);

John W. Kramer, Mt. Pleasant, MI (US);

Erin B. Vogel, Midland, MI (US);

Phillip D. Hustad, Natick, MA (US);

Peter Trefonas, III, Medway, MA (US);

Assignees:

DOW GLOBAL TECHNOLOGIES LLC, Midland, MI (US);

ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 183/10 (2006.01); C08G 77/16 (2006.01); C08G 77/442 (2006.01);
U.S. Cl.
CPC ...
C09D 183/10 (2013.01); C08G 77/16 (2013.01); C08G 77/442 (2013.01); Y10T 428/31663 (2015.04);
Abstract

Disclosed herein is a composition comprising a brush polymer; where the brush polymer comprises a reactive moiety that is reacted to a substrate upon which it is disposed; and a block copolymer; where the block copolymer comprises a first block and a second block that are covalently bonded to each other; where the first block comprises a first polymer and a second block comprises a second polymer; where the first polymer comprises less than or equal to 10 atomic percent polysiloxane; where the second polymer comprises at least 15 atomic percent polysiloxane; where the brush polymer is chemically different from the first polymer and the second polymer; and where the first polymer is chemically different from the second polymer; and wherein the block copolymer is disposed upon the brush polymer.


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