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Marlborough, MA, United States of America

Rohm & Haas Electronic Materials LLC

USPTO Granted Patents = 697

% Expired Patents = 33.9

CIPO Patents = 1

EPO Patents = 248

Trademarks = 25

Forward Citations = 3,627

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568 inventors (with patents filed for the assignee):

Peter Trefonas, Iii (84 out of 118 patents)

Cheng-Bai Xu (61 out of 65 patents)

Mingqi Li (60 out of 66 patents)

4. Deyan Wang (59 out of 65 patents)

5. James F Cameron (57 out of 102 patents)

6. Cong Liu (56 out of 59 patents)

7. Phillip Dene Hustad (46 out of 95 patents)

8. Emad Aqad (44 out of 52 patents)

9. Maria Anna Rzeznik (42 out of 47 patents)

10. Michael K Gallagher (42 out of 62 patents)

11. Jong Keun Park (41 out of 45 patents)

12. James W Thackeray (40 out of 92 patents)

13. Shintaro Yamada (34 out of 41 patents)

14. Suzanne M Coley (28 out of 40 patents)

15. Robert K Barr (27 out of 57 patents)

Core Competencies:

Photoresist Compositions

Pattern Formation

Electroplating Methods

Coating Compositions

Optoelectronic Devices

Dielectric Applications

Quantum Dots

Silicon-Containing Underlayers

Aromatic Resins

Metal Plating

Rheology Modifiers

Acidic Electroplating

697 patents: Sort by Forward Citations

1. 12761554 - Photoactive compounds, photoresist compositions including the same, and pattern formation methods (2026-10-13),

2. 12442084 - Metal-clad polymer films and electronic devices (2025-10-14),

3. 12428744 - Nickel electroplating compositions for rough nickel (2025-09-30),

4. 12411409 - Aromatic underlayer (2025-09-09),

5. 12398479 - Copper electroplating baths containing reaction products of amines, polyacrylamides and bisepoxoides (2025-08-26),

6. 12228859 - Pattern formation methods (2025-02-18),

7. 12140866 - Photoacid generators, photoresist compositions, and pattern formation methods (2024-11-12),

8. 12099300 - Aromatic underlayer (2024-09-24),

9. 12085854 - Photoresist compositions and pattern formation methods (2024-09-10),

10. 11999844 - Optically clear shear thickening fluids and optical display device comprising same (2024-06-04),

11. 11960206 - Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device (2024-04-16),

12. 11947258 - Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition (2024-04-02),

13. 11940732 - Coating compositions and methods of forming electronic devices (2024-03-26),

14. 11940731 - Photoresist topcoat compositions and methods of processing photoresist compositions (2024-03-26),

15. 11940730 - Photoresist compositions and pattern formation methods (2024-03-26),

Company Overview

Rohm & Haas Electronic Materials LLC, based in Marlborough, MA, specializes in advanced photoresist technology, focusing on the development of innovative photoresist compositions and coating solutions. The company is recognized for its expertise in pattern formation and electroplating methods, catering to the needs of optoelectronic devices and dielectric applications. Additionally, Rohm & Haas is involved in the advancement of silicon-containing underlayers and quantum dots, positioning itself as a key player in the semiconductor and electronics materials industry.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

697 Patents

#3 in Marlborough, MA

#41 in Massachusetts

#722 in US

#1,433 in the World

Marlborough, MA, United States of America

Rohm & Haas Electronic Materials LLC

Forward Citations = 3,627

568 inventors:

Peter Trefonas, Iii (84 out of 118 patents)

Cheng-Bai Xu (61 out of 65 patents)

Mingqi Li (60 out of 66 patents)

4. Deyan Wang (59 out of 65 patents)

5. James F Cameron (57 out of 102 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Rohm & Haas Electronic Materials LLC. Retrieved from https://idiyas.com/company/rohm-and-haas-electronic-materials

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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