Shrewsbury, MA, United States of America

Shintaro Yamada

This inventor holds 41 USPTO granted patents and 12 published patent applications, primarily in Photoresist Technology. Top assignees: Rohm & Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd., Dupont Electronic Materials International, LLC. Active years: 2006-2026.

USPTO Granted Patents = 41 (Patent Applications = 12)

% Patents Active = 75.6

Average Co-Inventor Count = 5.5

ph-index = 5

Forward Citations = 67(Granted Patents)

Location History:

Marlborough, MA (US) (2006 - 2018)
Shrewsbury, MA (US) (2014 - 2024)

Company Filing History:

34 out of 696

Rohm & Haas Electronic Materials LLC

patents

7 out of 150

Rohm and Haas Electronic Materials Korea Ltd.

patents

5 out of 20

Dupont Electronic Materials International, LLC

patents

4. 1 out of 4,798

Dow Global Technolgoies LLC

patents

5. 1 out of 23

Rohm and Haas Electronics Materials LLC

where one patent can have more than one assignee

Years Active: 2006-2026

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Areas of Expertise:

Photoresist

Underlayer Composition

Aromatic Resins

Silicon-Based Hardmask

Adhesion Promotion

Coating Compositions

Gap-Filling Method

Photoacid Generator

Patterning Methods

Wet-Strippable Antireflectant

Electronic Devices

Polymers

41 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12704778 - Resist underlayer compositions and pattern formation methods using such compositions (2026-08-11),

2. 12572073 - Photoresist underlayer composition (2026-03-10),

3. 12411409 - Aromatic underlayer (2025-09-09),

4. 12379660 - Adhesion promoting photoresist underlayer composition (2025-08-05),

5. 12313971 - Coated underlayer for overcoated photoresist (2025-05-27),

6. 12287576 - Underlayer compositions and patterning methods (2025-04-29),

7. 12099300 - Aromatic underlayer (2024-09-24),

8. 11940732 - Coating compositions and methods of forming electronic devices (2024-03-26),

9. 11817316 - Coating compositions and methods of forming electronic devices (2023-11-14),

10. 11762294 - Coating composition for photoresist underlayer (2023-09-19),

11. 11733609 - Silicon-containing underlayers (2023-08-22),

12. 11506979 - Method using silicon-containing underlayers (2022-11-22),

13. 11360387 - Silicon-containing underlayers (2022-06-14),

14. 11175581 - Aromatic resins for underlayers (2021-11-16),

15. 11042093 - Gap-filling method (2021-06-22),

Title: Shintaro Yamada: Pioneering Inventor from Shrewsbury

Introduction: Shintaro Yamada is a renowned inventor hailing from Shrewsbury, Massachusetts, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Shintaro Yamada's latest patents include cutting-edge advancements in artificial intelligence, renewable energy solutions, and sustainable transportation technologies.

Career Highlights: With a career spanning over two decades, Shintaro Yamada has established himself as a visionary inventor with a keen focus on developing solutions that address pressing global challenges. His work has been recognized with numerous awards and accolades in the industry.

Collaborations: Throughout his career, Shintaro Yamada has collaborated with leading research institutions, universities, and tech companies to bring his innovative ideas to life. His partnerships have resulted in the successful commercialization of several groundbreaking inventions.

Conclusion: Shintaro Yamada's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and entrepreneurs. His contributions to the world of technology have left an indelible mark, shaping the future of innovation for years to come.