The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2026
Filed:
May. 31, 2019
Applicant:
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Inventors:
Li Cui, Westborough, MA (US);
Shintaro Yamada, Shrewsbury, MA (US);
Iou-Sheng Ke, Andover, MA (US);
Paul J. Labeaume, Auburn, MA (US);
Suzanne M. Coley, Mansfield, MA (US);
James F. Cameron, Brookline, MA (US);
Keren Zhang, Shrewsbury, MA (US);
Joshua Kaitz, Watertown, MA (US);
Assignee:
DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC, Marlborough, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); C08K 3/04 (2006.01); C08L 25/06 (2006.01); C08L 61/06 (2006.01); G03F 7/00 (2006.01); G03F 7/09 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0035 (2013.01); C08K 3/045 (2017.05); C08L 25/06 (2013.01); C08L 61/06 (2013.01); G03F 7/094 (2013.01); G03F 7/16 (2013.01); G03F 7/11 (2013.01);
Abstract
A resist underlayer composition including a polymer having a polymer backbone and a substituted or unsubstituted fullerene group pendant to the polymer backbone, and a solvent in an amount of from 50 to 99.9 weight % based on the total resist underlayer composition.