The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2025
Filed:
Dec. 18, 2020
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Joshua Kaitz, Watertown, MA (US);
Ke Yang, Westborough, MA (US);
Keren Zhang, Kirkland, WA (US);
Li Cui, Westborough, MA (US);
James F. Cameron, Brookline, MA (US);
Dan B. Millward, Ukiah, CA (US);
Shintaro Yamada, Shrewsbury, MA (US);
DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC, Marlborough, MA (US);
Abstract
A photoresist underlayer composition comprising a poly(arylene ether); an additive of formula (14):D-(L-Ar—[X]) (14); anda solvent, wherein, in formula (14), D is a substituted or unsubstituted Corganic group, optionally wherein D is an organic acid salt of the substituted or unsubstituted Corganic group; each Lis independently a single bond or a divalent linking group, when Lis a single bond, D may be a substituted or unsubstituted Ccycloalkyl or substituted or unsubstituted Cheterocycloalkyl that is optionally fused with Ar, each Ar is independently a monocyclic or polycyclic Caromatic group, each X is independently —OR, —SR, or —NRR, m is an integer of 1 to 6, each n is independently an integer of 0 to 5, provided that a sum of all n is 2 or greater, and Rto Rare as provided herein.