The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2025
Filed:
Jul. 06, 2021
Applicant:
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Inventors:
Anton Chavez, West Newton, MA (US);
Iou-Sheng Ke, Andover, MA (US);
Shintaro Yamada, Shrewsbury, MA (US);
Assignee:
DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC, Marlborough, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); C08F 20/36 (2006.01); C09D 133/14 (2006.01); G03F 7/075 (2006.01); G03F 7/09 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C08F 20/36 (2013.01); C09D 133/14 (2013.01); G03F 7/0752 (2013.01); G03F 7/091 (2013.01);
Abstract
A method of forming a pattern, the method comprising applying a layer of a coating composition over a substrate; curing the applied coating composition to form a coated underlayer; and forming a photoresist layer over the coated underlayer, wherein the coating composition comprises a first material comprising two or more hydroxy groups; a second material comprising two or more glycidyl groups; an additive comprising a protected amino group; and a solvent.