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Southborough, MA, United States of America

Cheng-Bai Xu

USPTO Granted Patents = 65 (Patent Applications = 16)

EPO Patents = 9 (Patent Applications = 24)

Average Co-Inventor Count = 3.7

ph-index = 5

Forward Citations = 106(Granted Patents)

Forward Citations (Not Self Cited) = 82(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Marlborough, MA (US) (2019)
Southboro, MA (US) (2009 - 2023)
Southborough, MA (US) (2012 - 2023)

Company Filing History:

Rohm & Haas Electronic Materials LLC

Dow Global Technolgoies LLC

Rohm and Haas Electronic Materials Korea Ltd.

Rohm and Haas Electronics Materials LLC

5. 2 out of 832,843

Other

patents

where one patent can have more than one assignee

Years Active: 2009-2025

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Areas of Expertise:

Photolithography

Photoresist Compositions

Photoacid Generators

Pattern Formation

Ion Implantation

Gap-Fill Methods

Hardmask

Electronic Devices

Acid Generator Compounds

Cholate Photoacid Generators

Polymers

Dendritic Compounds

65 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12228859 - Pattern formation methods (2025-02-18),

2. 11846885 - Topcoat compositions and photolithographic methods (2023-12-19),

3. 11754927 - Photoresist pattern trimming compositions and pattern formation methods (2023-09-12),

4. 11506981 - Photoresist pattern trimming compositions and pattern formation methods (2022-11-22),

5. 11106137 - Compositions comprising base-reactive component and processes for photolithography (2021-08-31),

6. 10809616 - Cholate photoacid generators and photoresists comprising same (2020-10-20),

7. 10719014 - Photoresists comprising amide component (2020-07-21),

8. 10670965 - Polymers and photoresist compositions (2020-06-02),

9. 10578969 - Photoresist topcoat compositions and methods of processing photoresist compositions (2020-03-03),

10. 10558122 - Compositions comprising sulfonamide material and processes for photolithography (2020-02-11),

11. 10539870 - Photoresists comprising carbamate component (2020-01-21),

12. 10527934 - Photoresists comprising ionic compound (2020-01-07),

13. 10466588 - Sulfonyl photoacid generators and photoresists comprising same (2019-11-05),

14. 10359698 - Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography (2019-07-23),

15. 10222699 - Compositions and processes for immersion lithography (2019-03-05),

Title: The Innovative Journey of Cheng-Bai Xu

Introduction: Cheng-Bai Xu, a talented inventor based in Southborough, MA (US), has made significant contributions to the field of technology with his groundbreaking inventions.

Latest Patents: Cheng-Bai Xu holds several patents in the areas of artificial intelligence, renewable energy, and medical devices, showcasing his diverse range of expertise and innovative spirit.

Career Highlights: With a background in engineering and a passion for problem-solving, Cheng-Bai Xu has led successful projects that have revolutionized industries and improved the lives of many.

Collaborations: Throughout his career, Cheng-Bai Xu has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life and make a lasting impact on society.

Conclusion: Cheng-Bai Xu's dedication to innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

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