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For the Inventor, By the Inventor

Southborough, MA, United States of America

Cheng-Bai Xu

This inventor holds 65 USPTO granted patents and 16 published patent applications and 9 EPO patents, primarily in Photolithography Techniques (CPC class G03F). Top assignees: Rohm & Haas Electronic Materials LLC, Dow Global Technolgoies LLC, Rohm and Haas Electronic Materials Korea Ltd.. Active years: 2009-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Cheng-Bai Xu. Retrieved from https://idiyas.com/inventor/cheng-bai-xu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 65 

% Patents Active = 86.2

 

Average Co-Inventor Count = 3.7

ph-index = 5

Forward Citations = 106(Granted Patents)

Forward Citations (Not Self Cited) = 82(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Marlborough, MA (US) (2019)
  • Southboro, MA (US) (2009 - 2023)
  • Southborough, MA (US) (2012 - 2023)

Company Filing History:

goldMedal61 out of 697 
 
Rohm & Haas Electronic Materials LLC
 patents
silverMedal5 out of 4,807 
 
Dow Global Technolgoies LLC
 patents
bronzeMedal3 out of 150 
 
Rohm and Haas Electronic Materials Korea Ltd.
 patents
4. 2 out of 23 
 
Rohm and Haas Electronics Materials LLC
 patents
5. 2 out of 834,513 
Other
 patents
where one patent can have more than one assignee

Years Active: 2009-2025

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Areas of Expertise:
Photolithography
Photoresist Compositions
Pattern Formation
Acid Generators
Polymer Processes
Topcoat Compositions
Photoacid Generators
Trimming Methods
Immersion Lithography
Electronic Devices
Gap-fill Methods
Hardmask
65 patents (USPTO):Explore Patents
1. 12228859 - Pattern formation methods (2025-02-18),
2. 11846885 - Topcoat compositions and photolithographic methods (2023-12-19),
3. 11754927 - Photoresist pattern trimming compositions and pattern formation methods (2023-09-12),
4. 11506981 - Photoresist pattern trimming compositions and pattern formation methods (2022-11-22),
5. 11106137 - Compositions comprising base-reactive component and processes for photolithography (2021-08-31),
6. 10809616 - Cholate photoacid generators and photoresists comprising same (2020-10-20),
7. 10719014 - Photoresists comprising amide component (2020-07-21),
8. 10670965 - Polymers and photoresist compositions (2020-06-02),
9. 10578969 - Photoresist topcoat compositions and methods of processing photoresist compositions (2020-03-03),
10. 10558122 - Compositions comprising sulfonamide material and processes for photolithography (2020-02-11),
11. 10539870 - Photoresists comprising carbamate component (2020-01-21),
12. 10527934 - Photoresists comprising ionic compound (2020-01-07),
13. 10466588 - Sulfonyl photoacid generators and photoresists comprising same (2019-11-05),
14. 10359698 - Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography (2019-07-23),
15. 10222699 - Compositions and processes for immersion lithography (2019-03-05),

Title: The Innovative Journey of Cheng-Bai Xu

Introduction: Cheng-Bai Xu, a talented inventor based in Southborough, MA (US), has made significant contributions to the field of technology with his groundbreaking inventions.

Latest Patents: Cheng-Bai Xu holds several patents in the areas of artificial intelligence, renewable energy, and medical devices, showcasing his diverse range of expertise and innovative spirit.

Career Highlights: With a background in engineering and a passion for problem-solving, Cheng-Bai Xu has led successful projects that have revolutionized industries and improved the lives of many.

Collaborations: Throughout his career, Cheng-Bai Xu has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life and make a lasting impact on society.

Conclusion: Cheng-Bai Xu's dedication to innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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