The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2020
Filed:
May. 31, 2013
Applicant:
Rohm and Haas Electronic Materials, Llc, Marlborough, MA (US);
Inventors:
William Williams, III, Ipswich, MA (US);
Cong Liu, Shrewsbury, MA (US);
Cheng-Bai Xu, Southboro, MA (US);
Assignee:
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 269/04 (2006.01); C07C 271/24 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 269/04 (2013.01); C07C 271/24 (2013.01); G03F 7/0397 (2013.01); G03F 7/0046 (2013.01); G03F 7/0392 (2013.01);
Abstract
New photoresist compositions are provided that comprise a carbamate compound that comprises 1) a carbamate group and 2) an ester group. Preferred photoresists of the invention may comprise a resin with acid-labile groups; an acid generator compound; and a carbamate compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer.