IDiyas

For the Inventor, By the Inventor

Northborough, MA, United States of America

Emad Aqad

USPTO Granted Patents = 46 

 

Average Co-Inventor Count = 3.4

ph-index = 5

Forward Citations = 63(Granted Patents)


Location History:

  • Shrewsbury, MA (US) (2012 - 2020)
  • Nothborough, MA (US) (2022 - 2023)
  • Northborough, MA (US) (2014 - 2024)
  • Marlborough, MA (US) (2020 - 2024)

Company Filing History:

goldMedal44 out of 696 
 
Rohm & Haas Electronic Materials LLC
 patents
silverMedal4 out of 146 
 
Rohm and Haas Electronic Materials Korea Ltd.
 patents
bronzeMedal2 out of 10 
 
Dupont Electronic Materials International, LLC
 patents
4. 1 out of 4,629 
 
Dow Global Technolgoies LLC
 patents
where one patent can have more than one assignee

Years Active: 2012-2025

where 'Filed Patents' based on already Granted Patents

46 patents (USPTO):
1. 12287576 - Underlayer compositions and patterning methods (2025-04-29),
2. 12276910 - Photoresist compositions and pattern formation methods (2025-04-14),
3. 12140866 - Photoacid generators, photoresist compositions, and pattern formation methods (2024-11-12),
4. 11960206 - Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device (2024-04-16),
5. 11947258 - Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition (2024-04-02),
6. 11932713 - Monomers, polymers and lithographic compositions comprising same (2024-03-19),
7. 11880134 - Salts and photoresists comprising same (2024-01-23),
8. 11852972 - Photoresist compositions and pattern formation methods (2023-12-26),
9. 11829069 - Photoresist compositions and methods (2023-11-28),
10. 11613519 - Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition (2023-03-28),
11. 11567408 - Coating composition for use with an overcoated photoresist (2023-01-31),
12. 11550217 - Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device (2023-01-10),
13. 11505565 - Zwitterion compounds and photoresists comprising same (2022-11-22),
14. 11448960 - Salts and photoresists comprising same (2022-09-20),
15. 11269252 - Method for forming pattern using antireflective coating composition including photoacid generator (2022-03-08),

Title: Inventor Emad Aqad - Revolutionizing Technology

Introduction: Emad Aqad, a visionary inventor based in Northborough, MA, is renowned for his groundbreaking contributions to the field of technology.

Latest Patents: Emad Aqad holds several patents in the areas of artificial intelligence, renewable energy, and biotechnology, showcasing his diverse range of expertise and innovative spirit.

Career Highlights: With a career spanning over two decades, Emad Aqad has worked with leading tech companies, research institutions, and universities to develop cutting-edge solutions that have revolutionized various industries.

Collaborations: Throughout his career, Emad Aqad has collaborated with top scientists, engineers, and researchers from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Emad Aqad's relentless pursuit of innovation and his passion for pushing the boundaries of technology make him a true pioneer in the field of inventions.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…