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Northborough, MA, United States of America

Emad Aqad

USPTO Granted Patents = 47 (Patent Applications = 23)

EPO Patents = 5 (Patent Applications = 10)

Average Co-Inventor Count = 3.2

ph-index = 5

Forward Citations = 65(Granted Patents)

Location History:

Shrewsbury, MA (US) (2012 - 2020)
Nothborough, MA (US) (2022 - 2023)
Northborough, MA (US) (2014 - 2024)
Marlborough, MA (US) (2020 - 2024)

Company Filing History:

Rohm & Haas Electronic Materials LLC

Rohm and Haas Electronic Materials Korea Ltd.

Dupont Electronic Materials International, LLC

4. 1 out of 4,642

Dow Global Technolgoies LLC

where one patent can have more than one assignee

Years Active: 2012-2025

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Areas of Expertise:

Photoacid Generators

Photoresist Compositions

Pattern Formation Methods

Lithographic Compositions

Electronic Device Fabrication

Iodine-Containing Polymers

Dendritic Compounds

Acid-Cleavable Monomers

Zwitterion Compounds

Coating Compositions

Underlayer Resins

Photosensitive Compositions

47 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12493241 - Photoacid generators, photoresist compositions, and pattern formation methods (2025-12-09),

2. 12287576 - Underlayer compositions and patterning methods (2025-04-29),

3. 12276910 - Photoresist compositions and pattern formation methods (2025-04-14),

4. 12140866 - Photoacid generators, photoresist compositions, and pattern formation methods (2024-11-12),

5. 11960206 - Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device (2024-04-16),

6. 11947258 - Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition (2024-04-02),

7. 11932713 - Monomers, polymers and lithographic compositions comprising same (2024-03-19),

8. 11880134 - Salts and photoresists comprising same (2024-01-23),

9. 11852972 - Photoresist compositions and pattern formation methods (2023-12-26),

10. 11829069 - Photoresist compositions and methods (2023-11-28),

11. 11613519 - Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition (2023-03-28),

12. 11567408 - Coating composition for use with an overcoated photoresist (2023-01-31),

13. 11550217 - Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device (2023-01-10),

14. 11505565 - Zwitterion compounds and photoresists comprising same (2022-11-22),

15. 11448960 - Salts and photoresists comprising same (2022-09-20),

Title: Inventor Emad Aqad - Revolutionizing Technology

Introduction: Emad Aqad, a visionary inventor based in Northborough, MA, is renowned for his groundbreaking contributions to the field of technology.

Latest Patents: Emad Aqad holds several patents in the areas of artificial intelligence, renewable energy, and biotechnology, showcasing his diverse range of expertise and innovative spirit.

Career Highlights: With a career spanning over two decades, Emad Aqad has worked with leading tech companies, research institutions, and universities to develop cutting-edge solutions that have revolutionized various industries.

Collaborations: Throughout his career, Emad Aqad has collaborated with top scientists, engineers, and researchers from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Emad Aqad's relentless pursuit of innovation and his passion for pushing the boundaries of technology make him a true pioneer in the field of inventions.

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