The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2025
Filed:
Oct. 07, 2024
Applicant:
Dupont Electronic Materials International, Llc, Marlborough, MA (US);
Inventor:
Emad Aqad, Northborough, MA (US);
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 51/02 (2006.01); C07C 303/32 (2006.01); C07C 309/12 (2006.01); C07C 381/12 (2006.01); C08F 220/30 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 51/02 (2013.01); C07C 303/32 (2013.01); C07C 309/12 (2013.01); C07C 381/12 (2013.01); C08F 220/303 (2020.02); G03F 7/0397 (2013.01); G03F 7/2004 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01);
Abstract
Photoacid generators comprising a moiety of formula (1): wherein: Aris a substituted or unsubstituted aryl group; Ris an alkyl or aryl group, each of which may be substituted or unsubstituted, wherein Arand Rare optionally connected together by a single bond or a divalent linking group to form a ring; Y is a single bond or a divalent group; and * is the point of attachment of the moiety to another atom of the photoacid generator. The photoacid generator compounds find particular use in photoresist compositions that can be used to form lithographic patterns for the formation of electronic devices.