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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11829069 B1

PDFFull Text
Date of Patent:
Nov. 28, 2023

Filed:

Dec. 31, 2018

Photoresist compositions and methods

Applicant:

Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);

Inventors:

Joshua Kaitz, Watertown, MA (US);

Tomas Marangoni, Marlborough, MA (US);

Emad Aqad, Nothborough, MA (US);

Amy M. Kwok, Shrewsbury, MA (US);

Mingqi Li, Shrewsbury, MA (US);

Thomas Cardolaccia, Natick, MA (US);

Choong-Bong Lee, Westborough, MA (US);

Ke Yang, Natick, MA (US);

Cong Liu, Shrewsbury, MA (US);

Assignee:

ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);

Attorney:

CANTOR COLBURN LLP

Primary Examiner:

Martin J Angebranndt

Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/16 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); C09D 133/16 (2006.01); C08F 220/24 (2006.01); C08F 220/28 (2006.01); C08F 220/18 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C08F 220/24 (2013.01); C08F 220/283 (2020.02); C09D 133/16 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/0397 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/2041 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); C08F 220/1808 (2020.02);
Abstract

New photoresist and topcoat compositions are provided that are useful in a variety of applications. In one aspect, new photoresist compositions are provided that comprise: (a) a first matrix polymer; (b) one or more acid generators; and (c) one or more additive compounds of Formulae (I) and/or (II).

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Kaitz, Joshua. (2023). Photoresist compositions and methods (U.S. Patent No. 11829069). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11829069

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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