The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2025
Filed:
Jun. 03, 2021
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Emad Aqad, Northborough, MA (US);
Brandon Wenning, San Diego, CA (US);
Choong-Bong Lee, Westborough, MA (US);
James W. Thackeray, Braintree, MA (US);
Ke Yang, Westborough, MA (US);
James F. Cameron, Brookline, MA (US);
DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC, Marlborough, MA (US);
Abstract
A photoresist composition comprising: a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group; a second polymer comprising a first repeating unit comprising an acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a base-soluble group, wherein the base-soluble group has a pKa of less than or equal to 12, and wherein the base-soluble group does not comprise a hydroxy-substituted aryl group; a photoacid generator; and a solvent, wherein the first polymer and the second polymer are different from each other.