The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2015
Filed:
Feb. 28, 2012
Young Cheol Bae, Weston, MA (US);
Rosemary Bell, Wayland, MA (US);
Thomas Cardolaccia, Needham, MA (US);
Seung-hyun Lee, Marlborough, MA (US);
Yi Liu, Wayland, MA (US);
Jong Keun Park, Hudson, MA (US);
Young Cheol Bae, Weston, MA (US);
Rosemary Bell, Wayland, MA (US);
Thomas Cardolaccia, Needham, MA (US);
Seung-Hyun Lee, Marlborough, MA (US);
Yi Liu, Wayland, MA (US);
Jong Keun Park, Hudson, MA (US);
Rohm and Haas Electronics Materials LLC, Marlborough, MA (US);
Abstract
Provided are photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.