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For the Inventor, By the Inventor

Wayland, MA, United States of America

Yi Liu

USPTO Granted Patents = 12 

 

Average Co-Inventor Count = 3.4

ph-index = 5

Forward Citations = 63(Granted Patents)


Location History:

  • Shrewsbury, MA (US) (2012 - 2013)
  • Wayland, MA (US) (2012 - 2015)

Company Filing History:

goldMedal10 out of 696 
 
Rohm & Haas Electronic Materials LLC
 patents
silverMedal2 out of 23 
 
Rohm and Haas Electronics Materials LLC
 patents
bronzeMedal2 out of 4,629 
 
Dow Global Technolgoies LLC
 patents
where one patent can have more than one assignee

Years Active: 2012-2015

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12 patents (USPTO):
1. 8975001 - Photoresist compositions and methods of forming photolithographic patterns (2015-03-10),
2. 8771917 - Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns (2014-07-08),
3. 8614050 - Polymers, photoresist compositions and methods of forming photolithographic patterns (2013-12-24),
4. 8609891 - Photoacid generators and photoresists comprising same (2013-12-17),
5. 8507185 - Methods of forming electronic devices (2013-08-13),
6. 8492075 - Methods of forming electronic devices (2013-07-23),
7. 8492068 - Methods of forming electronic devices (2013-07-23),
8. 8465901 - Methods of adjusting dimensions of resist patterns (2013-06-18),
9. 8431329 - Self-aligned spacer multiple patterning methods (2013-04-30),
10. 8394571 - Methods of forming electronic devices (2013-03-12),
11. 8338083 - Methods of forming electronic devices (2012-12-25),
12. 8338079 - Compositions and methods for forming electronic devices (2012-12-25),

Title: The Innovative Contributions of Yi Liu

Introduction

Yi Liu is a prominent inventor based in Wayland, MA, known for his significant contributions to the field of semiconductor manufacturing. With a total of 12 patents to his name, Liu has made remarkable advancements in photolithography and photoresist compositions.

Latest Patents

Among his latest patents, Liu has developed photoresist compositions and methods of forming photolithographic patterns. These innovations provide useful photoresist compositions that are essential in creating photolithographic patterns. Additionally, he has introduced substrates coated with these photoresist compositions, which are particularly applicable in the manufacture of semiconductor devices. Another notable patent involves (meth)acrylate monomers containing acetal moieties, along with polymers and photoresist compositions derived from these monomers. These inventions also find utility in forming photolithographic patterns and include methods for creating electronic devices.

Career Highlights

Throughout his career, Yi Liu has worked with leading companies in the electronics sector, including Rohm and Haas Electronic Materials LLC. His expertise in the field has allowed him to contribute significantly to advancements in semiconductor technology.

Collaborations

Liu has collaborated with notable professionals in his field, including Young Cheol Bae and Thomas Cardolaccia. Their combined efforts have furthered the development of innovative solutions in photolithography.

Conclusion

Yi Liu's work exemplifies the spirit of innovation in the semiconductor industry. His patents and collaborations highlight his commitment to advancing technology and improving manufacturing processes.

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