The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 24, 2013

Filed:

Dec. 31, 2011
Applicants:

Young Cheol Bae, Weston, MA (US);

Thomas H. Peterson, Midland, MI (US);

Yi Liu, Wayland, MA (US);

Jong Keun Park, Hudson, MA (US);

Seung-hyun Lee, Marlborough, MA (US);

Thomas Cardolaccia, Newton, MA (US);

Inventors:

Young Cheol Bae, Weston, MA (US);

Thomas H. Peterson, Midland, MI (US);

Yi Liu, Wayland, MA (US);

Jong Keun Park, Hudson, MA (US);

Seung-Hyun Lee, Marlborough, MA (US);

Thomas Cardolaccia, Newton, MA (US);

Assignees:

Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);

Dow Global Technologies LLC, Midland, MI (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); C08F 224/00 (2006.01); C08F 220/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

Polymers include a unit comprising a particular acetal moiety and a unit comprising a lactone moiety, photoresist compositions containing such a polymer, substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.


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