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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9482948 B1

PDFFull Text
Date of Patent:
Nov. 01, 2016

Filed:

Oct. 22, 2015

Photoresist compositions and methods of forming photolithographic patterns

Applicant:

Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);

Inventors:

Young Cheol Bae, Weston, MA (US);

Deyan Wang, Hudson, MA (US);

Thomas Cardolaccia, Newton, MA (US);

Seokho Kang, Sturbridge, MA (US);

Rosemary Bell, Wayland, MA (US);

Assignee:

Rohm and Haas Electronic Materials LLC, Malborough, MA (US);

Attorney:

Jonathan D. Baskin

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/40 (2006.01); G03F 7/038 (2006.01); H01L 21/027 (2006.01); C07C 69/54 (2006.01); G03F 7/039 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/16 (2006.01); C08F 220/28 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0382 (2013.01); C07C 69/54 (2013.01); G03F 7/0392 (2013.01); G03F 7/0395 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/16 (2013.01); G03F 7/20 (2013.01); G03F 7/2041 (2013.01); G03F 7/32 (2013.01); G03F 7/325 (2013.01); G03F 7/40 (2013.01); H01L 21/0274 (2013.01); H01L 21/0276 (2013.01); C07C 2103/74 (2013.01); C08F 2220/283 (2013.01);
Abstract

Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

Find Patent Forward Citations

Bae, Young. (2016). Photoresist compositions and methods of forming photolithographic patterns (U.S. Patent No. 9482948). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9482948

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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