The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2016
Filed:
Oct. 22, 2015
Applicant:
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Inventors:
Young Cheol Bae, Weston, MA (US);
Deyan Wang, Hudson, MA (US);
Thomas Cardolaccia, Newton, MA (US);
Seokho Kang, Sturbridge, MA (US);
Rosemary Bell, Wayland, MA (US);
Assignee:
Rohm and Haas Electronic Materials LLC, Malborough, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/40 (2006.01); G03F 7/038 (2006.01); H01L 21/027 (2006.01); C07C 69/54 (2006.01); G03F 7/039 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/16 (2006.01); C08F 220/28 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0382 (2013.01); C07C 69/54 (2013.01); G03F 7/0392 (2013.01); G03F 7/0395 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/16 (2013.01); G03F 7/20 (2013.01); G03F 7/2041 (2013.01); G03F 7/32 (2013.01); G03F 7/325 (2013.01); G03F 7/40 (2013.01); H01L 21/0274 (2013.01); H01L 21/0276 (2013.01); C07C 2103/74 (2013.01); C08F 2220/283 (2013.01);
Abstract
Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.