The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2016
Filed:
Dec. 31, 2011
Applicants:
Young Cheol Bae, Weston, MA (US);
Matthew M. Meyer, Midland, MI (US);
Jibin Sun, Worcester, MA (US);
Seung-hyun Lee, Marlborough, MA (US);
Jong Keun Park, Hudson, MA (US);
Inventors:
Young Cheol Bae, Weston, MA (US);
Matthew M. Meyer, Midland, MI (US);
Jibin Sun, Worcester, MA (US);
Seung-Hyun Lee, Marlborough, MA (US);
Jong Keun Park, Hudson, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/20 (2006.01); G03F 7/039 (2006.01); G03F 7/32 (2006.01); C08F 220/28 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2041 (2013.01); C08F 220/28 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/325 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01);
Abstract
Polymers containing a unit having a particular acetal moiety and photoresist compositions containing such a polymer. Substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, photoresist compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.