The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2015
Filed:
Feb. 28, 2012
Applicants:
Young Cheol Bae, Weston, MA (US);
Seung-hyun Lee, Marlborough, MA (US);
Inventors:
Young Cheol Bae, Weston, MA (US);
Seung-Hyun Lee, Marlborough, MA (US);
Assignee:
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01); G03F 7/32 (2006.01); G03F 7/09 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/325 (2013.01); G03F 7/094 (2013.01); G03F 7/2041 (2013.01);
Abstract
Provided are photoresist developer compositions that include a mixture of organic solvents. Also provided are methods of forming photolithographic patterns using negative tone development, coated substrates and electronic devices formed by the methods. The methods find particular applicability in the manufacture of electronic devices.