The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2014
Filed:
Dec. 02, 2011
Applicants:
Young Cheol Bae, Weston, MA (US);
David Richard Wilson, Midland, MI (US);
Jibin Sun, Worcester, MA (US);
Inventors:
Young Cheol Bae, Weston, MA (US);
David Richard Wilson, Midland, MI (US);
Jibin Sun, Worcester, MA (US);
Assignees:
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Dow Global Technologies LLC, Midland, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
Abstract
Provided are polymers and photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.