Danville, NH, United States of America

Ronald L DiCarlo, Jr

This inventor holds 18 USPTO granted patents and 5 published patent applications and 4 EPO patents, primarily in Vapor Delivery Devices. Top assignees: Rohm & Haas Electronic Materials LLC, Ceres Technologies, Inc., Shipley Company LLC. Active years: 2004-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ronald L DiCarlo, Jr. Retrieved from https://idiyas.com/inventor/ronald-l-dicarlo-jr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 18 

% Patents Active = 83.3

 

Average Co-Inventor Count = 2.2

ph-index = 5

Forward Citations = 82(Granted Patents)


Location History:

  • Newfields, NH (US) (2004 - 2005)
  • Danville, NH (US) (2008 - 2023)

Company Filing History:


Years Active: 2004-2023

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Areas of Expertise:
Vapor Delivery Device
Evaporation Vessel
Manufacturing Methods
Organometallic Purification
Alkyl Group VA Metals
Trialkylindium Preparation
Organoindium Compounds
Constant Concentration Evaporation
18 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Ronald L. DiCarlo, Jr.

Introduction: Ronald L. DiCarlo, Jr. is a notable inventor based in Danville, NH, with a prolific output of 18 patents to his name. His work primarily focuses on vapor delivery devices and methods of their manufacture and use, showcasing his expertise in the field of chemical engineering and applications.

Latest Patents: Among his latest patents is a significant invention titled "Vapor delivery device, methods of manufacture and methods of use thereof." This method involves the transportation of a first stream of a carrier gas to a delivery device containing a liquid precursor compound. Subsequently, it details the transportation of a second stream of carrier gas downstream of the delivery device, culminating in the combining of both streams to create a third stream. The innovative aspect of this technology is that it ensures the dew point of the vapor of the liquid precursor in this third stream is lower than the temperature of the plumbing that directs the vapor to Chemical Vapor Deposition (CVD) reactors, ensuring efficiency and effectiveness in manufacturing processes.

Career Highlights: Ronald has had a commendable career, with key roles at reputable companies such as Rohm & Haas Electronic Materials LLC and Ceres Technologies, Inc. His tenure at these organizations has allowed him to make significant contributions to innovations in materials science and chemical engineering.

Collaborations: Throughout his career, Ronald has worked alongside noted individuals such as Egbert Woelk and Deodatta Vinayak Shenai-Khatkhate. These collaborations have undoubtedly enriched his inventions and extended his influence in the field of innovative technologies.

Conclusion: Ronald L. DiCarlo, Jr.'s contributions to the realm of vapor delivery technology and his extensive patent portfolio position him as a significant figure in the innovation landscape. His work continues to influence advancements in chemical engineering, providing substantial benefits to various industries reliant on effective and efficient vapor delivery systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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