The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2018
Filed:
May. 20, 2016
Applicant:
Ceres Technologies, Inc., Saugerties, NY (US);
Inventors:
Egbert Woelk, North Andover, MA (US);
Ronald L. DiCarlo, Danville, NH (US);
Assignee:
Ceres Technologies, Inc., Saugerties, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 14/24 (2006.01); C23C 14/54 (2006.01); C23C 16/448 (2006.01); C30B 23/00 (2006.01); C30B 25/14 (2006.01); C23C 16/30 (2006.01); C23C 14/06 (2006.01);
U.S. Cl.
CPC ...
C23C 16/455 (2013.01); C23C 14/243 (2013.01); C23C 14/54 (2013.01); C23C 16/4482 (2013.01); C30B 23/00 (2013.01); C30B 25/14 (2013.01); C23C 14/0617 (2013.01); C23C 14/0629 (2013.01); C23C 16/301 (2013.01); C23C 16/306 (2013.01);
Abstract
Disclosed is a method of providing a constant concentration of a metal-containing precursor compound in the vapor phase in a carrier gas. Such method is particularly useful in supplying a constant concentration of a gaseous metal-containing compound to a plurality of vapor deposition reactors.