The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2020
Filed:
Dec. 19, 2017
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Kevin Rowell, Brighton, MA (US);
Cong Liu, Shrewsbury, MA (US);
Cheng Bai Xu, Southborough, MA (US);
Irvinder Kaur, Northborough, MA (US);
Xisen Hou, Lebanon, NH (US);
Mingqi Li, Shrewsbury, MA (US);
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Abstract
Pattern-formation methods comprise: (a) providing a substrate; (b) forming a photoresist pattern over the substrate; (c) applying a pattern treatment composition to the photoresist pattern, the pattern treatment composition comprising a solvent mixture comprising a first organic solvent and a second organic solvent, wherein the first organic solvent has a boiling point that is greater than a boiling point of the second organic solvent, and wherein the first organic solvent has a boiling point of 210° C. or more; and (d) thereafter heating the photoresist pattern. The methods find particular applicability in the manufacture of semiconductor devices.