Worcester, MA, United States of America

Gregory P Prokopowicz

USPTO Granted Patents = 19 

 

Average Co-Inventor Count = 4.1

ph-index = 4

Forward Citations = 64(Granted Patents)


Location History:

  • Lancaster, MA (US) (2006 - 2014)
  • Worcester, MA (US) (2013 - 2023)

Company Filing History:


Years Active: 2006-2023

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19 patents (USPTO):

Certainly! Here's the article about inventor Gregory P Prokopowicz:

Title: Unveiling the Innovations of Gregory P Prokopowicz in Photoresist Technology

Introduction:

Gregory P Prokopowicz, a prolific inventor based in Worcester, MA (US), is renowned for his groundbreaking work in the field of photoresist compositions and pattern formation methods. With an impressive portfolio of 19 patents under his name, Prokopowicz has been a driving force behind advancements in this critical area of semiconductor manufacturing.

Latest Patents:

Among Gregory P Prokopowicz's latest patents is the revolutionary "Photoresist compositions and pattern formation methods." This patent introduces a novel photoresist composition that includes a first polymer derived from a monomer with specific characteristics, a photoacid generator, a quencher, and a solvent. Another remarkable patent of his involves photoresists comprising an amide component, designed to enhance the performance of photoresist coatings.

Career Highlights:

Throughout his distinguished career, Gregory P Prokopowicz has made significant contributions while working at esteemed companies such as Rohm & Haas Electronic Materials LLC and Shipley Company, L.L.C. His expertise and innovative spirit have propelled the development of cutting-edge technologies in the semiconductor industry.

Collaborations:

Prokopowicz has collaborated closely with industry peers to bring his inventions to fruition. Notable colleagues include Michael K Gallagher and Cong Liu, who have worked alongside him to push the boundaries of photoresist technology and refine manufacturing processes.

Conclusion:

In conclusion, Gregory P Prokopowicz stands as a beacon of innovation in the realm of photoresist compositions and pattern formation methods. His relentless pursuit of excellence and commitment to advancing semiconductor technologies have cemented his legacy as a visionary inventor in the field.

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