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For the Inventor, By the Inventor

Singapore, Singapore

John Leonard Sudijono

This inventor holds 79 USPTO granted patents and 27 published patent applications, primarily in Semiconductor Manufacturing (CPC class H01L). Top assignees: Chartered Semiconductor Manufacturing Ltd (Corporation), Applied Materials, Inc., Globalfoundries Singapore Pte. Ltd.. Active years: 2000-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John Leonard Sudijono. Retrieved from https://idiyas.com/inventor/john-leonard-sudijono

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 79 

% Patents Active = 82.3

Average Co-Inventor Count = 5.5

ph-index = 13

Forward Citations = 575(Granted Patents)

Forward Citations (Not Self Cited) = 556(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • S'pore, SG (2004)
  • Hillbrooks, SG (2005 - 2008)
  • Singapore, SG (2000 - 2024)

Company Filing History:

goldMedal42 out of 962 
 
Chartered Semiconductor Manufacturing Ltd (Corporation)
 patents
silverMedal30 out of 14,544 
 
Applied Materials, Inc.
 patents
bronzeMedal4 out of 1,065 
 
Globalfoundries Singapore Pte. Ltd.
 patents
4. 4 out of 858 
 
National University of Singapore
 patents
5. 1 out of 2 
 
Chartered Semiconductor
 patents
6. 1 out of 688 
 
Nanyang Technological University
 patents
7. 2 out of 834,708 
Other
 patents
where one patent can have more than one assignee

Years Active: 2000-2026

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Areas of Expertise:
Silicon Nitride Etching
Diamond Film Deposition
Low-K Dielectrics
Carbon-Based Films
EUV Photoresist Patterns
Molybdenum Precursors
Chalcogen Precursors
Nucleation Methods
Surface Hydrophilicity
Contact Oxides Removal
In Situ Nucleation
Tribological Properties
79 patents (USPTO):Explore Patents
1. 12772764 - Methods of forming conformal silicon oxycarbonitride thin films on high aspect ratio semiconductor structures (2026-10-20),
2. 12733420 - Methods of selectively etching silicon nitride (2026-09-08),
3. 12690404 - Methods of selectively etching silicon nitride (2026-07-21),
4. 12666891 - Area selective carbon-based film deposition (2026-06-23),
5. 12650648 - Method to reduce line edge roughness for EUV photoresist pattern (2026-06-09),
6. 12642015 - Methods of forming conformal transition metal dichalcogenide films for memory and logic applications (2026-05-26),
7. 12628623 - Selective deposition for sub 20 nm pitch EUV patterning (2026-05-12),
8. 12622192 - Methods of selectively etching silicon nitride (2026-05-05),
9. 12610791 - Method of forming carbon-based spacer for EUV photoresist patterns (2026-04-21),
10. 12550643 - Oxidants and strained-ring precursors (2026-02-10),
11. 12534797 - Vapor-phase precursor seeding for diamond film deposition (2026-01-27),
12. 12469683 - Water vapor plasma to enhance surface hydrophilicity (2025-11-11),
13. 12442104 - Nanocrystalline diamond with amorphous interfacial layer (2025-10-14),
14. 12415824 - Molybdenum(0) precursors for deposition of molybdenum films (2025-09-16),
15. 12327733 - Methods to reduce UNCD film roughness (2025-06-10),

Sure, I can help you with that. Here is the article about inventor John Sudijono:

Title: John Sudijono: Pioneering Innovations in Nanocrystalline Diamond Technology

Introduction:

John Sudijono, a prominent inventor based in Singapore, is renowned for his dedication to innovation and his relentless pursuit of excellence in the field of nanocrystalline diamond technology. His groundbreaking work continues to inspire the next generation of inventors and shape the future of technology.

Latest Patents:

1. In situ nucleation for nanocrystalline diamond film deposition: John's method of depositing a nanocrystalline diamond film is revolutionizing the manufacture of integrated circuits. By treating a substrate with specific plasma treatments, he successfully nucleates diamond particles to form a high-quality nanocrystalline diamond film.

2. Tribological properties of diamond films: John's innovation involves using nanocrystalline diamond as a hard mask in processing substrates for integrated circuits. His method, combining different nanocrystalline diamond recipes, results in a smooth surface with high hardness and modulus.

Career Highlights:

John Sudijono is a valuable asset to Applied Materials, Inc., where he passionately explores and implements cutting-edge technologies in nanocrystalline diamond. His expertise and dedication have led to the development of groundbreaking solutions for the semiconductor industry.

Collaborations:

John has collaborated with talented individuals at Applied Materials, Inc. His coworkers Vicknesh Sahmuganathan and Eswaranand Venkatasubramanian have been instrumental in pushing the boundaries of nanocrystalline diamond technology alongside him. Together, they have achieved remarkable advancements in the field.

Conclusion:

Inventor John Sudijono's remarkable contributions to nanocrystalline diamond technology reflect his unwavering commitment to innovation and excellence. His work not only revolutionizes the semiconductor industry but also serves as a beacon of inspiration for aspiring inventors worldwide. John's legacy of pushing technological boundaries will undoubtedly continue to influence the landscape of innovation for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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